Semiconductor Engineering

Process Variation Analysis Of Device Performance Using Virtual Fabrication — Methodology Demonstrated On A CMOS 14-nm FinFET Vehicle

A new methodology to assess the impact of fabrication inherent process variability on 14-nm fin field effect transistor (FinFET) device performance. August 18th, 2021 - By: Coventor A new methodology ...
Semiconductor Engineering

Process Variation Not A Solved Issue

SE: Especially with advanced nodes, there are many types of variation in the process and today’s design and verification tools have to understand this. How does variation impact the sphere of your ...