Mega Bog (“experimental melodic jazz-pop” musician). Ojay Morgan (aka “Zebra Katz”). Shilpa Ray (self-described “fire breathing Cyclops”). Bassem Youssef (political comedian). DJ Mojo (at press time, ...

Photo-lithography applications, such as the production of integrated circuit boards, are increasingly using dry film photo-resists. The photo-resist is often used as a component of a laminated stack, ...

(Nanowerk News) Toshiba Corporation has announced that it has developed a high resolution photoresist (photo-sensitive film) essential for future application of EUV (extreme ultraviolet) lithography ...

TOKYO — Tokyo Electron Limited is beginning to instruct users of its equipment on the use of a surfactant rinse that can prevent a problem with chip manufacturing at the 90-nm node; the collapse of ...

Toshiba has announced development of a high-resolution photo-sensitive film (photoresist) essential for future application of extreme ultraviolet (EUV) lithography in semiconductor fabrication, and ...