Three PPPL researchers have earned the prestigious Kaul Foundation Prize for their groundbreaking work in fusion stability.
Abstract: Plasma etching introduces a physically activated chemical process highly utilized in the semiconductor industry. However, for the creation of etched structures mask has to be prepared on top ...
Abstract: In this paper, the influence of the transverse magnetic field (TMF) on the post-arc residual plasma dissipation process of vacuum circuit breaker (VCB) is investigated by simulation. A ...
Russia has unveiled its first fully domestic plasma-etching and plasma-deposition cluster systems capable of manufacturing microchips at the 65-nanometer node. This breakthrough boosts Russia’s ...
This paper presents the state of the art of self-etch adhesive systems. Four topics are shown in this review and included: the historic of this category of bonding ...
Inspired by the feathers of a bird species whose plumage absorbs nearly all light, researchers at Cornell University have created a fabric that does the same. Their new material reflects only 0.13% of ...
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