Photo-lithography applications, such as the production of integrated circuit boards, are increasingly using dry film photo-resists. The photo-resist is often used as a component of a laminated stack, ...

G-line photoresist is a type of photoresist that responds to G-line ultraviolet (UV) light with a wavelength around 436 nanometers.One advantage of G-line photoresist is its cost-effectiveness ...

(Nanowerk News) Toshiba Corporation has announced that it has developed a high resolution photoresist (photo-sensitive film) essential for future application of EUV (extreme ultraviolet) lithography ...

Toshiba has announced development of a high-resolution photo-sensitive film (photoresist) essential for future application of extreme ultraviolet (EUV) lithography in semiconductor fabrication, and ...

TOKYO — Tokyo Electron Limited is beginning to instruct users of its equipment on the use of a surfactant rinse that can prevent a problem with chip manufacturing at the 90-nm node; the collapse of ...

CHICAGO, Oct. 22, 2020 /PRNewswire/ -- According to the new market research report "Photoresist & Photoresist Ancillaries Market by Application (Semiconductor & IC,LCD, PCB), Photoresist Type (ArF ...