It's a mistake to assume wafer clamp rings have to polyimide. Several other work about as well. Silicon wafers aren't the only things that lose material in the various etching steps of IC ...

(Nanowerk News) Imec and KLA Tencor have established a metrology method for optimizing the etch rate uniformity (ERU) in a transformer coupled plasma (TCP) reactor. The proposed metrology method makes ...

A team of physicists has uncovered some of the physics that make possible the etching of silicon computer chips, which power cell phones, computers, and a huge range of electronic devices. Physicist ...

Deep inside your smartphone are a handful of interesting miniature electromechanical devices. The accelerometer is a MEMS device, and was produced with some of the most impressive industrial processes ...

In this interview, AZoM talks to Bas Derksema about advancements in plasma etching and deposition processes for compound semiconductor materials applications. Please could you introduce yourself and ...

Akara® Solves Key Scaling Challenges for Chipmakers, with Unique Plasma Control Capabilities and a Suite of Proprietary New Technologies; Extends 20 years of Conductor Etch Leadership FREMONT, Calif., ...

Mass spectrometry, by contrast, is a powerful technique for the analysis of any process gas. Careful consideration of differences in pressure, reaction time scales and process flow is essential for ...

A large-scale (4-inch), highly uniform, and defect-free plasma etching technology, which will likely become the foundation of the industrial supply of molybdenum disulfide (MoS₂), a next-generation ...

The PE-100 Convertible plasma system incorporates reactive ion etching and isotropic etching/cleaning technologies into a stand-alone benchtop system. The all aluminum chamber has over 240 in. 2 of ...

Plasma Etch Inc. has released its fully automated plasma cleaner, the PE-25-jw. The unit, priced at $6,900, is equipped with a programmable logic controller and a single gas channel, with an option of ...