After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor ...

Released every 12 to 18 months, 3D NAND scaling outpaces most other semiconductor devices in replacement rate and performance ...

How chemical etching keeps tooling costs low and allows for rapid design changes. 1. Chemical etching can create complex, ...

Extracting hydrogen from water through electrolysis offers a promising route for increasing the production of hydrogen, a clean and environmentally friendly fuel. But one major challenge of water ...

A new cryogenic plasma etching technique developed by Japanese researchers dramatically accelerates semiconductor fabrication while cutting environmental impact, offering a potential breakthrough for ...

Photochemical etching is a machining technique that leverages the principles behind photography to shape a piece of sheet metal and turn it into a finished product or component. The modern form of ...

Mass spectrometry, by contrast, is a powerful technique for the analysis of any process gas. Careful consideration of differences in pressure, reaction time scales and process flow is essential for ...

In this interview, AZoM talks to Bas Derksema about advancements in plasma etching and deposition processes for compound semiconductor materials applications. Please could you introduce yourself and ...

What is Reactive Ion Etching (RIE)? Reactive Ion Etching (RIE) is a dry etching technique widely used in the fabrication of micro- and nanodevices. It combines the chemical reactivity of reactive ...

For maximum resolution in a scanning tunneling microscope (STM), an extremely sharp metallic tip is required, which serves as the point through which the STM “scans” a sample. A blunt tip reduces STM ...

The Global Semiconductor Etch Equipment Market revenue was USD 22730 Million in 2022 and is forecast to a readjusted size of USD 49330 Million by 2029 with a CAGR of 11.2% during the forecast period ...